Particle analyzing apparatus

ABSTRACT

A particle analyzing apparatus including a particle measuring section that measures a number or concentration of particles in a sample gas; a component analyzing section that measures an amount of each component of the particles in the sample gas; a flow path that branches into a first flow path that introduces the sample gas to the particle measuring section and a second flow path that introduces the sample gas to the component analyzing section; a first adjusting section that is provided in the first flow path and dilutes the sample gas with a dilution gas and introduces the diluted sample gas to the particle measuring section to adjust a measurement range of the particle measuring section; and a second adjusting section that is provided in the second flow path and adjusts an introduction time during which the sample gas is introduced to the component analyzing section.

BACKGROUND

The contents of the following Japanese patent application areincorporated herein by reference:

NO. 2016-013697 filed on Jan. 27, 2016.

1. Technical Field

The present invention relates to a particle analyzing apparatus.

2. Related Art

There has been interest in technology for measuring particles such asPM_(2.5) in the air. A conventional particle measuring apparatus isknown that measures the number and size of particles based on laserlight scattered by the particles in sample air, as shown in PatentDocument 1, for example. Furthermore, a component analyzing apparatus isknown that analyzes the amount of each component of the particles in asample gas, as shown in Patent Document 2, for example. Yet further, ameasuring apparatus is known that dilutes exhaust gas with dilution air,in order to expand the measurement range according to the concentrationof the exhaust gas when measuring exhaust gas containing a highconcentration of particles, as shown in Patent Document 3, for example.In this measuring apparatus, a portion of the diluted exhaust gas isguided to the measuring apparatus and the number of particles containedin this gas is counted.

Patent Document 1: Japanese Patent Application Publication No.2012-189483

Patent Document 2: International Publication WO 2011/114587

Patent Document 3: International Publication WO 2010/116959

In order to perform multiple types of analyses on the target particles,there is an idea of using a composite particle analyzing apparatus thatincludes both a particle measuring section and a component analyzingsection. However, when uniformly diluting the sample gas and performingmeasurement with the particle measuring section and the componentanalyzing section, there are cases where the detection sensitivity ofone of the particle measuring section and the component analyzingsection is reduced. Accordingly, there have been cases where it isdifficult to expand the measurement range while preventing a decrease inthe detection sensitivity in the particle analyzing apparatus includingthe particle measuring section and the component analyzing section.

SUMMARY

According to a first aspect of the present invention, provided is aparticle analyzing apparatus. The particle analyzing apparatus maycomprise a particle measuring section, a component analyzing section, aflow path, a first adjusting section, and a second adjusting section.The particle measuring section may measure a number or concentration ofparticles in a sample gas, based on laser light that is scattered by theparticles in the sample gas. The component analyzing section may measurean amount of each component of the particles in the sample gas. The flowpath may have one end thereof connected to the sample gas source. Theflow path may branch into a first flow path and a second flow path, at abranching point at the other end side. The first flow path may introducethe sample gas to the particle measuring section. The second flow pathmay introduce the sample gas to the component analyzing section. Thefirst adjusting section may be provided in the first flow path. Thefirst adjusting section may dilute the sample gas with a dilution gas.The first adjusting section may introduce the diluted sample gas to theparticle measuring section to adjust a measurement range of the particlemeasuring section. The second adjusting section may be provided in thesecond flow path. The second adjusting section may adjust anintroduction time during which the sample gas is introduced to thecomponent analyzing section.

The first adjusting section may include a dilution gas flow path and adilution gas flow rate control section. The dilution gas flow path mayhave one end thereof connected to a dilution gas source. The dilutiongas flow path may have another end thereof connected to the first flowpath. The dilution gas flow rate control section may be provided in thedilution gas flow path. The dilution gas flow rate control section maycontrol a flow rate of the dilution gas introduced to the first flowpath.

The particle analyzing apparatus may comprise an exhaust gas flow ratecontrol section. The exhaust gas flow rate control section may control aflow rate of an exhaust gas emitted from the particle measuring section

The particle analyzing apparatus may comprise a dilution ratecalculating section and a concentration calculating section. Thedilution rate calculating section may calculate a dilution rate based onthe flow rate of the dilution gas in the dilution gas flow rate controlsection and the flow rate of the exhaust gas in the exhaust gas flowrate control section. The concentration calculating section maycalculate a concentration of particles in the sample gas that has notbeen diluted, based on the dilution rate and the measurement result ofthe particle measuring section.

The second adjusting section may include a sample gas flow rate controlsection and a flow path opening/closing section. The sample gas flowrate control section may be arranged in the second flow path. The samplegas flow rate control section may control a flow rate of the sample gas.The flow path opening/closing section may be arranged in the second flowpath. The flow path opening/closing section may adjust an introductiontime during which the sample gas is introduced into the componentanalyzing section by switching between an open state and a closed state.

The particle analyzing apparatus may comprise an introduction amountcalculating section. The introduction amount calculating section maycalculate an introduction amount of the sample gas into the componentanalyzing section based on the flow rate of the sample gas in the samplegas flow rate control section and the introduction time during which thesample gas is introduced into the component analyzing section asadjusted by the flow path opening/closing section. The second adjustingsection may control the introduction rate of the sample gas to be withina predetermined range by adjusting a time of the open state of the flowpath opening/closing section.

The component analyzing section may include a particle beam generatingsection, a trap, an energy beam emitting section, and an analyzer. Theparticle beam generating section may emit a particle beam formed byparticles in the sample gas. The trap that may be arranged at a positionat which the particle beam is emitted. The trap may trap the particlesin the particle beam. The energy beam emitting section may irradiate thetrap with an energy beam to create a desorbed component by vaporizing,sublimating, or causing a reaction with the particles trapped in thetrap. The analyzer may measure an amount of each component of theparticles by analyzing the desorbed component.

The particle analyzing apparatus may comprise a bypass flow path, abypass flow rate control section, and an exhaust gas flow path. Thebypass flow path may branch from the second flow path. The bypass flowrate control section may be provided in the bypass flow path. The bypassflow rate control section may control a flow rate of the sample gasflowing through the bypass flow path such that a necessary flow rate ofthe sample gas introduced into the entire particle analyzing apparatusfrom the sample gas source is within a predetermined range. The exhaustgas flow path may have exhaust gas emitted from the particle measuringsection flow therethrough. The bypass flow path may be connected to theexhaust gas flow path.

The introduction time of the sample gas may be shorter when the numberor concentration of the particles measured by the particle measuringsection is higher.

The summary clause does not necessarily describe all necessary featuresof the embodiments of the present invention. The present invention mayalso be a sub-combination of the features described above.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows the overall configuration of a particle analyzing apparatus100 according to an embodiment of the present invention.

FIG. 2 is a schematic view of a configuration of an exemplary particlemeasuring section 200.

FIG. 3 shows a schematic configuration of an exemplary componentanalyzing section 300.

FIG. 4 shows an exemplary processing section 400.

FIG. 5 shows another exemplary configuration of an overall particleanalyzing apparatus 100.

FIG. 6 shows another example of a processing section 400.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

Hereinafter, some embodiments of the present invention will bedescribed. The embodiments do not limit the invention according to theclaims, and all the combinations of the features described in theembodiments are not necessarily essential to means provided by aspectsof the invention.

FIG. 1 shows the overall configuration of a particle analyzing apparatus100 according to an embodiment of the present invention. The particleanalyzing apparatus 100 includes a particle measuring section 200, acomponent analyzing section 300, and a processing section 400. Theparticle measuring section 200 measures the number or concentration ofparticles in a sample gas. The particle measuring section 200 mayfurther measure the size of the particles. The component analyzingsection 300 may measure the amount of each component of the particles inthe sample gas. For example, the component analyzing section 300measures the mass of each chemical component of the particles. Thesample gas may be air, or may be exhaust from an automobile or the like.

The particle analyzing apparatus 100 in this example includes theparticle measuring section 200 and the component analyzing section 300having measurement mechanisms that differ from each other. The particleanalyzing apparatus 100 may be a composite analyzing apparatus thatperforms multiple types of analyses on aerosol, which is particlesfloating in the sample gas. The particle measuring section 200 and thecomponent analyzing section 300 may be arranged in respective casings,and may each perform processes independently.

The particle measuring section 200 and the component analyzing section300 are connected in parallel. The particle analyzing apparatus 100includes a gas flow path that branches into a first flow path L1 and asecond flow path L2. The first flow path L1 introduces the sample gasinto the particle measuring section 200. The second flow path L2introduces the sample gas into the component analyzing section 300.

The particle analyzing apparatus 100 in this example includes a flowpath L0 that is an introduction pipe. One end of the flow path L0 isconnected to a sample gas source 10. The sample gas source 10 may be asample gas entrance for air or exhaust serving as the measurementtarget. The other end side of the flow path L0 branches into the firstflow path L1 and the second flow path L2 at a branching point 12. Thefirst flow path L1 and the second flow path L2 may also be pipes.

The particle analyzing apparatus 100 may have the first flow path L1 andthe second flow path L2 directly connected to the sample gas source 10,without including the flow path L0. In either example, sample gas isintroduced into the first flow path L1 and the second flow path L2 withthe same concertation.

The particle analyzing apparatus 100 includes a first adjusting section20 and a second adjusting section 30. The first adjusting section 20 isprovided in the first flow path L1. The first adjusting section 20dilutes the sample gas with a dilution gas and introduces the resultinggas to the particle measuring section 200. The first adjusting section20 adjusts the measurement range of the particle measuring section 200by introducing the diluted sample gas to the particle measuring section200.

The first adjusting section 20 may include a dilution gas flow path L3,a dilution gas source 22, a dilution gas flow rate control section 24,and a cleaning section 26. One end of the dilution gas flow path L3 isconnected to the dilution gas source 22 via the dilution gas flow ratecontrol section 24 and the cleaning section 26. The other end of thedilution gas flow path L3 is connected to the first flow path L1 at amerging point 28. The dilution gas flow path L3 may include a pluralityof pipes for providing connections between the dilution gas source 22and the dilution gas flow rate control section 24, between the dilutiongas flow rate control section 24 and the cleaning section 26, andbetween the cleaning section 26 and the merging point 28. The mergingpoint 28 may be a branched pipe that connects the dilution gas flow pathL3 to the first flow path L1, and may be a container that includes spacefor the dilution.

The dilution gas is clean dilution air that does not include any morethan a predetermined amount of particles, for example. The dilution gassource 22 is a compressed air source, for example. The compressed airsource may be a compressor. The sample gas from the sample gas source 10and the dilution gas from the dilution gas source 22 are mixed togetherat the merging point 28. Accordingly, sample gas that has been dilutedby the dilution gas flows downstream of the merging point 28. The samplegas diluted by the dilution gas is introduced to the particle measuringsection 200. The dilution gas flow rate control section 24 is providedin the dilution gas flow path L3.

The dilution gas flow rate control section 24 measures the flow rate A2of the dilution gas introduced to the first flow path L1, and controlsthis flow rate A2. The dilution gas flow rate control section 24 mayinclude a flow rate sensor, a flow rate control valve, and a controlcircuit. Specifically, the dilution gas flow rate control section 24 maybe a mass flow controller or a flowmeter with a needle valve. Flow ratesetting values are input to the dilution gas flow rate control section24 via the control circuit. The dilution gas flow rate control section24 may measure the actual flow rate A2. The dilution gas flow ratecontrol section 24 may continuously adjust the opening amount of theflow rate control valve such that the actual measurement value of theflow rate is controlled to be the flow rate setting value.

The cleaning section 26 includes a filter for cleaning the dilution gasby removing particles in the dilution gas. In this example, the cleaningsection 26 is arranged downstream from the dilution gas flow ratecontrol section 24, but in another example, the cleaning section 26 mayinstead be arranged upstream from the dilution gas flow rate controlsection 24. By removing the particles in the dilution gas, it ispossible to prevent measurement errors caused by particles in thedilution gas. If the dilution gas supplied by the dilution gas source 22is already clean to a point greater than or equal to a predeterminedreference level, the cleaning section 26 may be omitted.

The particle analyzing apparatus 100 includes an exhaust gas flow pathL4, an exhaust gas flow rate control section 40, and a first vacuumsection 44. One end of the exhaust gas flow path L4 is connected to theexhaust outlet of the particle measuring section 200. The other end ofthe exhaust gas flow path L4 is connected to the first vacuum section44. The first vacuum section 44 sucks in the exhaust gas via the exhaustgas flow path L4 and emits the exhaust gas to the outside of the system.The first vacuum section 44 may be a vacuum pump. The exhaust gasemitted from the particle measuring section 200 flows through theexhaust gas flow path L4. The exhaust gas is gas that has been measuredby the particle measuring section 200. The particle measuring section200 in this example emits the sample gas that has been diluted at themerging point 28 as exhaust gas after this sample gas has been measured.

The exhaust gas flow rate control section 40 is provided in the exhaustgas flow path L4. The exhaust gas flow rate control section 40 controlsthe flow rate A4 of the exhaust gas emitted from the particle measuringsection 200. The exhaust gas flow rate control section 40 may have thesame configuration as the dilution gas flow rate control section 24,aside from the control target gas being the exhaust gas instead of thedilution gas. The exhaust gas flow rate control section 40 may have theflow rate setting values input thereto. The exhaust gas flow ratecontrol section 40 may measure the flow rate A4 of the exhaust gas.

In the particle analyzing apparatus 100 of this example, the measurementrange of the particle measuring section 200 is adjusted by introducingthe diluted sample gas. On the other hand, the sample gas diluted by thefirst adjusting section 20 is not introduced to the component analyzingsection 300. The component analyzing section 300 is provided with asecond adjusting section 30 that increases the measurement range using adifferent method than the first adjusting section 20.

The second adjusting section 30 is arranged in the second flow path L2.The second adjusting section 30 adjusts the introduction time duringwhich the sample gas is introduced to the component analyzing section300. The second adjusting section 30 may include a sample gas flow ratecontrol section 32 and a flow path opening/closing section 34. Thesample gas flow rate control section 32 is arranged in the second flowpath L2. The sample gas flow rate control section 32 controls the flowrate A5 per unit time of the sample gas. The sample gas flow ratecontrol section 32 is an orifice that is a throttle valve forcontrolling the flow rate A5 per unit time to become the setting value,for example. If a control section that does not include a drive source,such as an orifice, is used as the sample gas flow rate control section32, a pressure measuring section 33 may be arranged directly after theorifice. The pressure measuring section 33 may be a pressure meter suchas a diaphragm that detects a pressure difference between the front andback of the orifice. An instruction value provided by the pressuremeasuring section 33 is electrically read and converted into the flowrate A5 per unit time of the sample gas for the sample gas flow ratecontrol section 32.

The flow path opening/closing section 34 is arranged in the second flowpath L2. The component analyzing section 300 is provided downstream fromthe flow path opening/closing section 34. In this example, the samplegas flow rate control section 32 is provided upstream from the flow pathopening/closing section 34. It should be noted that the sample gas flowrate control section 32 may be provided downstream from the flow pathopening/closing section 34, and that the flow path opening/closingsection 34 may further include the function of the sample gas flow ratecontrol section 32. A second vacuum section 60 is connected to anexhaust outlet of the component analyzing section 300 via an exhaust gasflow path L6. The second vacuum section 60 sucks in the exhaust gas viathe exhaust gas flow path L6 from the component analyzing section 300and emits this exhaust gas to the outside of the system. The secondvacuum section 60 is a vacuum pump.

The flow path opening/closing section 34 switches between an open stateand a closed state to adjust the introduction time during which thesample gas is introduced to the component analyzing section 300. Whenthe flow path opening/closing section 34 controls the second flow pathL2 to be in the closed state, the sample gas is not introduced to thecomponent analyzing section 300, and when the flow path opening/closingsection 34 controls the second flow path L2 to be in the open state, thesample gas is introduced to the component analyzing section 300. Theflow path opening/closing section 34 may be an electrically-drivenvalve, e.g. a ball valve electrically driven by an actuator. However,the flow path opening/closing section 34 is not particularly limited tothis, and any component may be used that is capable of controllingwhether the sample gas is introduced to the component analyzing section300.

The particle analyzing apparatus 100 includes a bypass flow path L5 thatbranches from the second flow path L2, and a bypass flow rate controlsection 50. One end of the bypass flow path L5 is connected to thesecond flow path L2. The other end of the bypass flow path L5 isconnected to the exhaust gas flow path L4 via the bypass flow ratecontrol section 50. A bypass merging point 42 connecting the bypass flowpath L5 and the exhaust gas flow path L4 may be downstream from theexhaust gas flow rate control section 40. In this way, the actualmeasurement value of the flow rate A4 for the exhaust gas flow ratecontrol section 40 is not affected.

The sample gas flowing through the bypass flow path L5 and the exhaustgas flowing through the exhaust gas flow path L4 are mixed together andemitted together to the outside of the system by the first vacuumsection 44. Since the first vacuum section 44 is provided in common forthe bypass flow path L5 and the exhaust gas flow path L4, there is noneed to attach a vacuum section for each flow path, and therefore spacecan be saved.

The bypass flow rate control section 50 is provided in the bypass flowpath L5. The bypass flow rate control section 50 controls the flow rateA6 of the sample gas flowing through the bypass flow path L5. The bypassflow rate control section 50 may be a mass flow controller or a flowmeter with a needle valve. The bypass flow rate control section 50 mayhave the same configuration as the dilution gas flow rate controlsection 24 and the exhaust gas flow rate control section 40, aside fromthe control target gas being the gas flowing through the bypass flowpath L5 instead of the dilution gas or the exhaust gas. Accordingly, adetailed description of this configuration is omitted.

The bypass flow rate control section 50 reduces the loss of samplemicroparticles in a case where the flow rate A1 of the sample gasintroduced into the first flow path L1 from the sample gas source 10 andthe flow rate A2 of the dilution gas are very low flow rates. Forexample, if the flow rate A1 and the flow rate A2 are each less than orequal to 10 mL/min, when the sample microparticles serving as themeasurement target are sucked in to the particle measuring section 200or the component analyzing section 300 from the sample gas source 10,there may be a large amount of pressure loss due to the tube diameterand tube length of the pipes L0, L1, and L2, and this may cause loss ofthe sample microparticles. However, in this example, the bypass flowrate control section 50 controls the sample gas to be sucked into thebypass flow path L5 with a flow rate greater than the flow rate A1 andthe flow rate A2. Accordingly, it is possible to reduce the loss ofsample microparticles.

The bypass flow rate control section 50 may perform control such thatthe necessary flow rate of sample gas flowing into the entire particleanalyzing apparatus 100 from the sample gas source 10 is within apredetermined range. For example, the bypass flow rate control section50 performs control such that the sum of the flow rates A1, A5, and A6is always a constant amount, in order to keep the necessary flow rate ofthe sample gas at a constant amount for the entire particle analyzingapparatus 100.

As an example, the flow rate A1 can be changed as a result of thedilution gas flow rate control section 24 and the exhaust gas flow ratecontrol section 40 adjusting the flow rate A2 and the flow rate A4 inorder to adjust the measurement range according to the sample gasconcentration. The flow rate A5 can also be changed according to achange in the flow rate A1. Furthermore, when the flow pathopening/closing section 34 is controlled to set the second flow path L2to the closed state, the flow rate A5 becomes zero and the sample gas isnot introduced into the component analyzing section 300. Accordingly,the bypass flow rate control section 50 may perform control tocompensate for these flow rate changes such that the sum of the flowrates A1, A5, and A6 always remains constant, in order to keep thenecessary flow rate of the sample gas constant for the entire particleanalyzing apparatus 100.

The bypass flow rate control section 50 may acquire informationconcerning the flow rate A2 of the dilution gas, the flow rate A4 of theexhaust gas, the flow rate A5 of the sample gas in the sample gas flowrate control section 32, and the open/closed state of the flow pathopening/closing section 34 via the processing section 400, and controlthe sum of the flow rates A1, A5, and A6 to always be a constant valuebased on this information.

An orifice is preferably used as the sample gas flow rate controlsection 32, and control sections that include a drive source such as amass flow controller or flow meter with a needle valve are preferablyused as the dilution gas flow rate control section 24, the exhaust gasflow rate control section 40, and the bypass flow rate control section50. The pipe between the sample gas source 10 and the particle measuringsection 200 and the pipe between the sample gas source 10 and thecomponent analyzing section 300 are flow paths through which themicroparticles serving as the measurement target pass. Accordingly, whena mass flow controller, a flow meter with a needle valve, and the likeare arranged in these flow paths, loss of microparticles is believed tooccur. In this example, it is possible to reduce the loss ofmicroparticles serving as the measurement targets, by adopting anorifice, which causes less loss of microparticles than a mass flowcontroller or flow meter with a needle valve, as the sample gas flowrate control section 32 arranged in the pipe between the sample gassource 10 and the component analyzing section 300.

There is no need to consider microparticle loss in the dilution gas flowrate control section 24, the exhaust gas flow rate control section 40,and the bypass flow rate control section 50 since the microparticlesserving as the measurement target do not pass therethrough or passtherethrough after being measured, and so a mass flow controller or flowmeter with a needle valve having a variable flow rate may be adoptedhere.

The processing section 400 may be a computer that processes varioustypes of data and signals and performs various types of control. Asshown by the dashed line in FIG. 1, the processing section 400 may beconnected in communication with each component of the dilution gas flowrate control section 24, the exhaust gas flow rate control section 40,the particle measuring section 200, the pressure measuring section 33,the flow path opening/closing section 34, the bypass flow rate controlsection 50, and the component analyzing section 300. The processingsection 400 may read the actual values of the flow rates from thedilution gas flow rate control section 24, the exhaust gas flow ratecontrol section 40, and the bypass flow rate control section 50.

As seen in this example, when an orifice is used for the sample gas flowrate control section 32, the processing section 400 cannot electricallyconnect to the orifice itself. Accordingly, the processing section 400may acquire a pressure value read by the pressure measuring section 33arranged immediately after the sample gas flow rate control section 32and calculate the flow rate A5 from the pressure value. If the pressurevalue has already been converted into the flow rate A5 by the pressuremeasuring section 33, the processing section 400 may acquire the flowrate A5 from the pressure measuring section 33.

The processing section 400 may transmit commands concerning the flowrate setting values to the dilution gas flow rate control section 24,the exhaust gas flow rate control section 40, and the bypass flow ratecontrol section 50. The processing section 400 may transmit commandsconcerning the time of the open state of the flow path opening/closingsection 34. The processing section 400 may calculate the open statetime, i.e. the introduction time. A first external transmitting section242 enabling communication is connected between the processing section400 and the particle measuring section 200. A second externaltransmitting section 362 enabling communication is connected between theprocessing section 400 and the component analyzing section 300. Thefirst external transmitting section 242 and the second externaltransmitting section 362 are transmission media, such as transmissioncables. The processing section 400 is described in detail further below.

FIG. 2 is a schematic view of a configuration of an exemplary particlemeasuring section 200. The particle measuring section 200 includes alight-blocking container 202, an emission nozzle 204, a recycling nozzle208, a laser irradiation section 214, a light receiving section 218, anda first signal processing section 240. The light-blocking container 202may be a container surrounded by walls. The light-blocking container 202provides a region that is shielded from outside light. The emissionnozzle 204 is arranged penetrating through a portion of a wall of thelight-blocking container 202. An emission opening 206 that emits gas isprovided in the tip of the emission nozzle 204.

The emission nozzle 204 emits the diluted sample gas, which isintroduced from the merging point 28 through the first flow path L1,from the emission opening 206. The recycling nozzle 208 is arrangedpenetrating through a portion of a wall of the light-blocking container202 at a position opposite the emission nozzle 204. A recycling opening210 that sucks in and recycles the sample gas that has been diluted isprovide in the tip of the recycling nozzle 208. The recycling opening210 of the recycling nozzle 208 is arranged opposite the emissionopening 206 of the emission nozzle 204. The other end of the recyclingnozzle 208 is connected to the exhaust gas flow rate control section 40via the exhaust gas flow path L4.

The emission nozzle 204 and the recycling nozzle 208 are not limited tothe examples shown in FIG. 2. The emission nozzle 204 and the recyclingnozzle 208 may each have a two-layer nozzle structure. The emissionnozzle 204 may form the sample gas into a beam by discharging the samplegas that includes the particles to be measured and wrapping the outsidewith clean sheath air. In this case, the recycling nozzle 208 mayseparate and recycle the sample gas and the sheath air.

The laser irradiation section 214 and the light receiving section 218are provided inside the light-blocking container 202. The laserirradiation section 214 radiates laser light 216 across a predetermineddistance toward the particle measuring region 212 between the emissionnozzle 204 and the recycling nozzle 208. The light receiving section 218receives scattered light 220 caused by the laser light 216 collidingwith the particles that are the measurement target. The light receivingsection 218 outputs an electrical signal according to the receivedoptical intensity of the scattered light 220. The light receivingsection 218 may include a photoelectric converter element that convertsthe received scattered light 220 into a pulsed electrical signal.

The first signal processing section 240 may be a received optical signalprocessing circuit. For example, the first signal processing section 240is a processor such as a microcomputer. The first signal processingsection 240 receives the electrical signal from the light receivingsection 218 via the first signal transmitting section 230. The firstsignal processing section 240 performs a calculation based on thereceived electrical signal.

Specifically, the first signal processing section 240 may calculate thesize of the particles based on the height of the pulses of theelectrical signal input from the light receiving section 218. The firstsignal processing section 240 may calculate the number of particlesbased on the number of pulses in the electrical signal. The first signalprocessing section 240 may calculate the concentration of particles,which is the number of particles per unit volume, based on the number ofparticles that have been counted. If measuring the size and number ofthe particles, there are cases where the particle measuring section 200measures the particle diameter distribution, which is a distribution ofa number of particles of each size. The result of the calculationperformed by the first signal processing section 240 is output to theprocessing section 400 via the first external transmitting section 242.

The light receiving section 218 may include a plurality of photoelectricconverter elements arranged according to a plurality of scatteringangles. In this case, the first signal processing section 240 acquiresthe intensity distribution of the scattered light 220 for eachscattering angle, based on the electrical signals from eachphotoelectric converter element. Since the scattering angle of thescattered light 220 changes according to the particle size, it ispossible to detect the particle diameter distribution from the intensitydistribution for each scattering angle. An apparatus configured asdisclosed in Japanese Patent Application Publication No. S61-14543 orJapanese Patent Application Publication No. 2012-189483, for example,can be used as the particle measuring section 200 that enables the basicconfiguration and basic operations described above.

FIG. 3 shows a schematic configuration of an exemplary componentanalyzing section 300. The component analyzing section 300 includes adepressurized container 302, an exhaust section 304, a particle beamgenerating section 310, and a trap 320. The depressurized container 302may be a depressurized chamber for providing a region that isdepressurized relative to the outside. The exhaust section 304 is avacuum pump for maintaining the depressurized state in the depressurizedcontainer 302.

The particle beam generating section 310 emits a particle beam 316formed of the microparticles in the sample gas. The particle beamgenerating section 310 is an aerodynamic lens, for example. The particlebeam generating section 310 is provided in a portion of a wall of thedepressurized container 302. The particle beam generating section 310penetrates through the wall of the depressurized container 302 whilemaintaining the air-tight state in the depressurized container 302. Theparticle beam generating section 310 may include a plurality of orifices312 that have a plurality of diaphragm structures established inside atube-shaped structure. A particle beam emission opening 314 is providedin one end of the particle beam generating section 310. The other end ofthe particle beam generating section 310 is connected to the secondadjusting section 30.

In the present invention, the term “particle beam 316 formed of themicroparticles in the sample gas” refers to the particle beam 316 formedof particles that have been compressed into a beam shape, such that eachparticle has the same flight and movement characteristics in the samplegas, from the sample gas in which the particles are floating freely byusing the aerodynamic characteristics of particles structured as a solidor liquid. The sample gas flows into the particle beam generatingsection 310 due to the pressure difference between the inside andoutside of the depressurized container 302. When the sample gas passesout of the inside of the particle beam generating section 310, the gasacting as a medium expands while moving, and therefore the linear motionis impeded by the orifices 312.

On the other hand, particles structured as a solid or liquid have astronger linear progression characteristic than gas particles, andtherefore the motion of particles that have passed through thefirst-stage orifice 312 are not significantly impeded by thesecond-stage and following orifices 312. Accordingly, the particles passthrough the particle beam emission opening 314 while being kept in thebeam shape, and are emitted as the particle beam 316 formed of particlesto the outside of the depressurized atmosphere.

The trap 320 traps the particles contained in the particle beam 316. Thetrap 320 includes a trap surface 322 that is irradiated by the particlebeam 316. The trap 320 has a mesh structure spanning at least from thetrap surface 322 to a portion with a predetermined thickness. The voidarea ratio of the trap 320 having the mesh structure is in a range ofgreater than or equal to 80% and less than or equal to 99% whenprojecting from the trap surface 322 side. The trap 320 is arranged at aposition to which the particle beam 316 is emitted. In the presentembodiment, the trap 320 is arranged at a position where the particlebeam 316 emitted from the particle beam emission opening 314 of theparticle beam generating section 310 arrives after travelling apredetermined distance within the depressurized container 302.

The gas phase component inside the depressurized container 302 decreasesdue to the depressurized atmosphere, and therefore the scattering of theparticles caused by the air flow occurring from the collisions with thetrap 320 is restricted. The particles in the particle beam 316 losekinetic energy while being trapped in the void of the trap 320. The trap320 may be arranged such that the trap surface 322 is inclined andopposite to the particle beam emission opening 314 of the particle beamgenerating section 310. In this way, the chance of particles bouncingoff the trap 320 and not being trapped is reduced, and the particles canbe more efficiently trapped by the particle beam 316.

The component analyzing section 300 further includes an energy beamemitting section 330, an analyzer 340, and a second signal processingsection 360. The energy beam emitting section 330 radiates an energybeam 331 toward the trap 320 and causes vaporization, sublimation, or areaction with the particles trapped in the trap 320, thereby creating adesorbed component. The energy beam 331 arrives at the trap 320 in thedepressurized container 302 through the translucent window 334 providedin a portion of a wall of the depressurized container 302. The energybeam 331 irradiates a predetermined region of the trap 320.

The energy beam 331 is not particularly limited, and may be anythingthat causes vaporization, sublimation, or a reaction with the particlestrapped in the trap 320 to generate the desorbed component suitable forcomponent analysis of the particles. For example, the energy beam 331 isan energy ray supplied by an infrared laser supplying device, a visiblelaser supplying device, an ultraviolet laser supplying device, an X-raysupplying device, or an ion beam supplying device.

The trap surface 322 of the trap 320 may be arranged somewhat inclinedto and opposite the emission opening 332 of the energy beam emittingsection 330. In this way, the energy beam 331 is incident at an inclinewith respect to a reference direction that is perpendicular to the trapsurface 322. Accordingly, it becomes easy for the energy beam 331 toreach the particles trapped in the trap 320, and the particles trappedin the trap 320 can be more efficiently vaporized, sublimated, or causedto react in order to create a desorbed component.

The analyzer 340 measures the amount of each component in the particlesby analyzing the desorbed component. The analyzer 340 may be aspectroscopic analyzer or mass spectrometer. The analyzer 340 outputs ananalysis signal corresponding to the analyzed intensity. One end of therecycling tube section 342 is connected to the introduction opening ofthe analyzer 340. The other end of the recycling tube section 342penetrates through a wall of the depressurized container 302 whilemaintaining the air-tight state of the depressurized container 302. Thedesorbed component is recycled via the recycling tube section 342 anintroduced into the analyzer 340.

The second signal processing section 360 may be a processing circuitthat processes the analytic signal resulting from the mass spectrometrymeasurement. For example, the second signal processing section 260 is aprocessor. The second signal processing section 360 receives theelectrical signal from the analyzer 340 via the second signaltransmitting section 350. The second signal transmitting section 350transmits the analytic signal from the analyzer 340 as an electricalsignal. The second signal processing section 360 calculates thecomponents of the particles and the amount of each component based onthe analytic signal received as an electrical signal. The calculation ofthe components of the particles and the amount of each component basedon the analytic signal can be realized using conventional massspectrometry and the like, and therefore a detailed description isomitted.

The results obtained from the calculation by the second signalprocessing section 360 may be output to the processing section 400 viathe second external transmitting section 362. An apparatus configured asdisclosed in International Publication WO 2011/114587, for example, canbe used as the component analyzing section 300 that enables the basicconfiguration and basic operations described above.

With the component analyzing section 300, the particles in the aerosolsample gas are collected in a focused manner in a predetermined regionand then irradiated with the energy beam 331 to create the desorbedcomponent that is to be analyzed, and therefore it is possible toanalyze the components of the particles and the amount of each componentwith high efficiency and high sensitivity. Furthermore, with theparticle analyzing apparatus 100 of this example, it is possible tomeasure the amount of each component with the component analyzingsection 300 while measuring the number, size, and concentration of theparticles with the particle measuring section 200, and therefore it ispossible to provide a composite particle analyzing apparatus that issuitable for analyzing measurement target particles in various ways.

FIG. 4 shows an exemplary processing section 400 in the particleanalyzing apparatus 100. The processing section 400 in this exampleincludes a dilution rate calculating section 410, a concentrationcalculating section 420, an introduction amount calculating section 430,and a component concentration calculating section 440. The dilution ratecalculating section 410 and the concentration calculating section 420calculate the dilution rate and the concentration for the particleanalyzing section 200. The dilution rate calculating section 410calculates the dilution rate based on the flow rate A2 of the dilutiongas for the dilution gas flow rate control section 24 and the flow rateA4 of the exhaust gas for the exhaust gas flow rate control section 40.The concentration calculating section 420 calculates the concentrationof the particles in the original sample gas before dilution, based onthe measurement results of the particle measuring section 200 and thecalculated dilution rate.

The introduction amount calculating section 430 and the componentconcentration calculating section 440 perform control and variouscalculations relating to the component analyzing section 300. Theintroduction amount calculating section 430 calculates the introductionamount of the sample gas into the component analyzing section 300 basedon the flow rate A5 per unit time of the sample gas for the sample gasflow rate control section 32 and the introduction time T1 of the samplegas into the component analyzing section 300. The introduction time T1is adjusted by the flow path opening/closing section 34. The componentconcentration calculating section 440 calculates the concentration ofeach component based on the measurement results from the componentanalyzing section 300 and the calculated introduction amount.

The processing section 400 is not limited to receiving the measurementresults and calculation results from each component, and may alsotransmit control information such as various commands to each component.For example, the processing section 400 designates desired flow ratesetting values for the dilution gas flow rate control section 24 and theexhaust gas flow rate control section 40.

The introduction amount calculating section 430 and the componentconcentration calculating section 440 may provide instructions to theflow path opening/closing section 34 of the second adjusting section 30such that the calculated introduction amount is within a predeterminedrange. Based on these instructions, the second adjusting section 30 mayadjust the open state time of the flow path opening/closing section 34to control the sample gas introduction amount to be within theprescribed range. The processing section 400 described above may be asingle computer or may be a plurality of computers. The processingsection 400 need not be arranged in a single casing, and may be dividedup and provided in one or both of the particle measuring section 200 andthe component analyzing section 300.

The particle analyzing apparatus 100 in this example having theconfiguration described above performs the following processes. In FIG.1, the flow rate A2 of the dilution gas supplied from the dilution gassource 22 may be controlled by the dilution gas flow rate controlsection 24 to be the flow rate setting value. The flow rate settingvalue may be designated by the processing section 400 or may be directlyinput by the first adjusting section 20. On the other hand, with theflow rate from the sample gas source 10 being A1, as shown in FIG. 1,the flow rate A3 of the diluted sample gas introduced to the particlemeasuring section 200 becomes the sum of the flow rate A1 and the flowrate A2.

The flow rate A4 of the exhaust gas output and recycled from theparticle measuring section 200 is controlled to be the flow rate settingvalue by the exhaust gas flow rate control section 40, and is equal tothe flow rate A3. The flow rate setting value for the flow rate A4 maybe designated by the processing section 400 or may be directly input.Accordingly, the aerosol sample introduced to the first particlemeasuring section 200 is the sample gas with a dilution obtained from aflow rate of A4/A3, i.e. a flow rate of A4/(A4−A2). The dilution ratecalculating section 410 may acquire the actual measurement value of theflow rate A2 from the dilution gas flow rate control section 24, and mayacquire the actual measurement value of the flow rate A4 from theexhaust gas flow rate control section 40. The dilution rate calculatingsection 410 calculates the dilution rate E1 by calculating A4/(A4−A2)using the acquired values of A2 and A4.

With the particle analyzing apparatus 100 in this example, it ispossible to calculate the dilution rate E1 without using the equipmentsuch as the mass flow controller for measuring the flow rate A1 from thesample gas source 10 located upstream from the particle measuringsection 200. Accordingly, the configuration of the apparatus can besimplified, and it is also possible to conserve space and reduce thecost. In a case where the processing section 400 transmits instructionsfor the setting flow rate value of the flow rate A2 to the dilution gasflow rate control section 24 and transmits instructions for the settingflow rate value for the flow rate A4 to the exhaust gas flow ratecontrol section 40, the dilution rate calculating section 410 maycalculate the dilution rate using the flow rate setting values insteadof the actual measurement values of the flow rates.

The particle measuring section 200 may measure the concentration ofparticles in the sample gas. With the measured value of the particleconcentration being S1, the measurement value S1 of the concentration ismultiplied by a dilution rate E1. Accordingly, the particleconcentration in the original sample gas that has not yet been dilutedis a value obtained by multiplying the measurement value S1 of theconcentration by the inverse of the dilution rate E1. The concentrationcalculating section 420 of the processing section 400 may acquire themeasurement value S1 from the first signal processing section 240 of theparticle measuring section 200 via the first external transmittingsection 242. The concentration calculating section 420 calculates theconcentration of the particles in the original sample gas that has notbeen diluted by multiplying the acquired measurement value S1 by theinverse of the dilution rate E1.

In the measurement performed by the particle measuring section 200, whenthe particle concentration in the sample gas is high and a plurality ofparticles overlap in the optical path of the laser light 216, there arecases where it is difficult to perform an accurate measurement. However,with the particle analyzing apparatus 100 of this example, measurementis performed after a sample gas with a high particle concentration isdiluted, and the actual concentration can be calculated by multiplyingthe resulting value by the dilution coefficient, and therefore themeasurement range can be increased.

The second adjusting section 30 is provided upstream in the componentanalyzing section 300. The second adjusting section 30 includes thesample gas flow rate control section 32 and the flow pathopening/closing section 34. With the flow rate A5 indicating the flowrate controlled by the sample gas flow rate control section 32, i.e. theflow rate of the sample gas introduced to the component analyzingsection 300, the introduction amount of the sample gas to the componentanalyzing section 300 can be calculated as the product of the flow rate5A and the introduction time T1, which is the open state time of theflow path opening/closing section 34.

The introduction amount calculating section 430 of the processingsection 400 may acquire the flow rate A5 calculated from the measurementvalue of the pressure measuring section 33. The introduction amountcalculating section 430 may acquire the open state time T1 from the flowpath opening/closing section 34. The introduction amount calculatingsection 430 calculates the introduction amount by calculating theproduct A5×T1 using the acquired values A5 and T1. If the processingsection 400 is transmitting commands concerning the open state time ofthe flow path to the flow path opening/closing section 34, theintroduction amount calculating section 430 may calculate theintroduction amount using the acquired flow rate A5 and the instructedopen state time, while tracking the open and closing operation of theflow path opening/closing section 34.

The component analyzing section 300 may measure the mass of eachcomponent of the particles in the sample gas. With S2 representing themeasurement value of the mass of each component, the mass concertationof each component is the value S2/(A5×T1) obtained by dividing themeasurement value S2 by (A5×T1). The component concentration calculatingsection 440 may acquire the measurement value S2 from the second signalprocessing section 360 of the component analyzing section 300, via thesecond external transmitting section 362. The component concentrationcalculating section 440 calculates the mass concentration of eachcomponent in the sample gas by dividing the acquired measurement valueS2 by the introduction amount (A5×T1).

If the measurement made by the component analyzing section 300 includestrapping the majority of particles of the particle beam 316 in the trap320 and creating a desorbed component by irradiating the majority of thetrapped particles with the energy beam 331, the mass concentration ofeach component can be calculated according to S2/(A5×T1). On the otherhand, if the trap 320 has already trapped a predetermined amount ofparticles, it is impossible to trap enough particles even if moreparticles are introduced. Accordingly, if an amount of particles beyondwhat can be trapped by the trap 320 are introduced, it is difficult toaccurately measure the concentration of each component.

Accordingly, the component analyzing section 300 controls theintroduction amount such that the amount of particles introduced to thecomponent analyzing section 300 does not exceed a predetermined range.By controlling the open state time T1 of the flow path opening/closingsection 34 to be short enough that the particle introduction amount iswithin the predetermined range, it is possible to increase themeasurement range.

If the concentration of particles in the sample gas is relatively high,even if the introduction amount (A5×T1) of the sample gas is relativelylow, there are cases where the actual introduction amount of particlescontained in the sample gas is high. When the number or concentration ofparticles measured by the particle measuring section 200 is higher, itcan be determined that the actual introduction amount of particles ishigh even if the same sample gas introduction amount of (A5×T1) is used.Accordingly, when the number or concentration of particles measured bythe particle measuring section 200 that can be measured in a relativelyshort time is higher, the introduction time T1 of the sample gas intothe component analyzing section 300 may be controlled to be shorter.Specifically, the processing section 400 acquires the detection resultsof the particle measuring section 200 and, based on the acquireddetection results, may transmit commands concerning the open state timeof the flow path opening/closing section 34.

With the particle analyzing apparatus 100 of this example, by mixingtogether the sample gas and the gas such as clean dilution air that doesnot contain particles and introducing this resulting gas into theparticle measuring section 200, it is possible to increase themeasurement range of the particle measuring section 200. Accordingly,the particle analyzing apparatus 100 of this example can be used formeasurement at any location where there is a high concentration ofparticles to be measured. The particle analyzing apparatus 100 candirectly measure particles that have a high concentration emitted froman exhaust source. On the other hand, by reducing the introduction timeduring which the sample gas need be introduced into the componentanalyzing section 300 compared to the conventional technology, it ispossible to increase the measurement range of the component analyzingsection 300.

With the particle analyzing apparatus 100 of this example, in acomposite analyzing apparatus used for various types of analyses oftarget particles, it is possible to increase the measurement range ofeach of the particle measuring section 200 and the component analyzingsection 300 included therein independently by a desired amount. Since awide measurement range can be adopted for both the particle measuringsection 200 and the component analyzing section 300, it is possible toincrease the measurement range without reducing the measurementcapability.

In the above description, orifices without a drive source are used asthe sample gas flow rate control section 32 and the pressure measuringsection 33 is provided immediately after the orifices, but the presentinvention is not limited to this example. FIG. 5 shows another exemplaryconfiguration of an overall particle analyzing apparatus 100. FIG. 6shows another example of a processing section 400. If microparticle lossis not a problem, a mass flow controller or flow meter with a needlevalve may be used as the sample gas flow rate control section 32, andthe pressure measuring section 33 may be omitted as shown in FIG. 5.

As shown by the dashed lines in FIG. 5, the processing section 400 maybe connected in a communicable manner to the dilution gas flow ratecontrol section 24, the exhaust gas flow rate control section 40, theparticle measuring section 200, the sample gas flow rate control section32, the flow path opening/closing section 34, the bypass flow ratecontrol section 50, and the component analyzing section 300. Theprocessing section 400 may read the actual measurement values of theflow rates from the dilution gas flow rate control section 24, theexhaust gas flow rate control section 40, the sample gas flow ratecontrol section 32, and the bypass flow rate control section 50. Theprocessing section 400 may transmit commands concerning the flow ratesetting values to the dilution gas flow rate control section 24, theexhaust gas flow rate control section 40, and the bypass flow ratecontrol section 50.

As shown in FIG. 6, the introduction amount calculating section 430 ofthe processing section 400 may acquire the actual measurement value ofthe flow rate A5 from the sample gas flow rate control section 32. Theintroduction amount calculating section 430 calculates the introductionamount by calculating (A5×T1) using the acquired values of A5 and T1. Ifthe processing section 400 transmits commands concerning the flow ratesetting value for the flow rate A5 to the sample gas flow rate controlsection 32 and transmits commands concerning the open state time of theflow path to the flow path opening/closing section 34, the introductionamount calculating section 430 may calculate the introduction amountusing the open state time according to the commands and the flow ratesetting value for the flow rate A5, according to the tracking abilitiesof the flow rate and open/close operation of the sample gas flow ratecontrol section 32 and the flow path opening/closing section 34.

In the examples shown in FIGS. 5 and 6 as well, the bypass flow ratecontrol section 50 may perform control such that the necessary flow rateof the sample gas introduced from the sample gas source 10 to the entireparticle analyzing apparatus 100 is within a predetermined range. Forexample, in order to maintain the necessary flow rate of the sample gasfor the entire particle analyzing apparatus 100, the bypass flow ratecontrol section 50 may control the sum of the flow rates A1, A5, and A6to always be a constant amount. Specifically, the processing section 400may transmit commands concerning the flow rate setting values to thebypass flow rate control section 50, according to the open/closed stateof the flow path opening/closing section 34 and the flow rates for thedilution gas flow rate control section 24, the exhaust gas flow ratecontrol section 40, and the sample gas flow rate control section 32. Thebypass flow rate control section 50 may control the flow rates such thatthe sum of the flow rates A1, A5, and A6 remains constant, based on thecommands concerning the flow rate setting values.

While the embodiments of the present invention have been described, thetechnical scope of the invention is not limited to the above describedembodiments. It is apparent to persons skilled in the art that variousalterations and improvements can be added to the above-describedembodiments. It is also apparent from the scope of the claims that theembodiments added with such alterations or improvements can be includedin the technical scope of the invention.

LIST OF REFERENCE NUMERALS

10: sample gas source, 12: branching point, 20: first adjusting section,22: dilution gas source, 24: dilution gas flow rate control section, 26:cleaning section, 28: merging point, 30: second adjusting section, 32:sample gas flow rate control section, 33: pressure measuring section,34: flow path opening/closing section, 40: exhaust gas flow rate controlsection, 42: bypass merging point, 44: first vacuum section, 50: bypassflow rate control section, 60: second vacuum section, 100: particleanalyzing apparatus, 200: particle measuring section, 202:light-blocking container, 204: emission nozzle, 206: emission opening,208: recycling nozzle, 210: recycling opening, 212: particle measuringregion, 214: laser irradiation section, 216: laser light, 218: lightreceiving section, 220: scattered light, 230: first signal transmittingsection, 240: first signal processing section, 242: first externaltransmitting section, 300: component analyzing section, 302:depressurized container, 304: exhaust section, 310: particle beamgenerating section, 312: orifice, 314: particle beam emission opening,316: particle beam, 320: trap, 322: trap surface, 330: energy beamemitting section, 331: energy beam, 332: emission opening, 334:translucent window, 340: analyzer, 342: recycling tube section, 350:second signal transmitting section, 360: second signal processingsection, 362: second external transmitting section, 400: processingsection, 410: dilution rate calculating section, 420: concentrationcalculating section, 430: introduction amount calculating section, 440:component concentration calculating section

What is claimed is:
 1. A particle analyzing apparatus comprising: aparticle measuring section that measures a number or concentration ofparticles in a sample gas, based on laser light that is scattered by theparticles in the sample gas; a component analyzing section that measuresan amount of each component of the particles in the sample gas; a flowpath that has one end thereof connected to a sample gas source and, at abranching point at the other end side, branches into a first flow paththat introduces the sample gas to the particle measuring section and asecond flow path that introduces the sample gas to the componentanalyzing section; a first adjusting section that is provided in thefirst flow path and dilutes the sample gas with a dilution gas andintroduces the diluted sample gas to the particle measuring section toadjust a measurement range of the particle measuring section; and asecond adjusting section that is provided in the second flow path andadjusts an introduction time during which the sample gas is introducedto the component analyzing section.
 2. The particle analyzing apparatusaccording to claim 1, wherein the first adjusting section includes: adilution gas flow path that has one end thereof connected to a dilutiongas source and another end thereof connected to the first flow path; anda dilution gas flow rate control section that is provided in thedilution gas flow path and controls a flow rate of the dilution gasintroduced to the first flow path.
 3. The particle analyzing apparatusaccording to claim 2, comprising: an exhaust gas flow rate controlsection that controls a flow rate of an exhaust gas emitted from theparticle measuring section.
 4. The particle analyzing apparatusaccording to claim 3, comprising: a dilution rate calculating sectionthat calculates a dilution rate based on the flow rate of the dilutiongas in the dilution gas flow rate control section and the flow rate ofthe exhaust gas in the exhaust gas flow rate control section; and aconcentration calculating section that calculates a concentration ofparticles in the sample gas that has not been diluted, based on thedilution rate and a measurement result of the particle measuringsection.
 5. The particle analyzing apparatus according to claim 1,wherein the second adjusting section includes: a sample gas flow ratecontrol section that is arranged in the second flow path and controls aflow rate of the sample gas; and a flow path opening/closing sectionthat is arranged in the second flow path and adjusts an introductiontime during which the sample gas is introduced into the componentanalyzing section by switching between an open state and a closed state.6. The particle analyzing apparatus according to claim 5, comprising: anintroduction amount calculating section that calculates an introductionamount of the sample gas into the component analyzing section based onthe flow rate of the sample gas in the sample gas flow rate controlsection and the introduction time during which the sample gas isintroduced into the component analyzing section as adjusted by the flowpath opening/closing section, wherein the second adjusting sectioncontrols an introduction rate of the sample gas to be within apredetermined range by adjusting a time of the open state of the flowpath opening/closing section.
 7. The particle analyzing apparatusaccording to claim 1, wherein the component analyzing section includes:a particle beam generating section that emits a particle beam formed byparticles in the sample gas; a trap that is arranged at a position atwhich the particle beam is emitted and traps the particles in theparticle beam; an energy beam emitting section that irradiates the trapwith an energy beam to create a desorbed component by vaporizing,sublimating, or causing a reaction with the particles trapped in thetrap; and an analyzer that measures an amount of each component of theparticles by analyzing the desorbed component.
 8. The particle analyzingapparatus according to claim 1, comprising: a bypass flow path thatbranches from the second flow path; a bypass flow rate control sectionthat is provided in the bypass flow path and controls a flow rate of thesample gas flowing through the bypass flow path such that a necessaryflow rate of the sample gas introduced into the entire particleanalyzing apparatus from the sample gas source is within a predeterminedrange; and an exhaust gas flow path through which flows exhaust gasemitted from the particle measuring section, wherein the bypass flowpath is connected to the exhaust gas flow path.
 9. The particleanalyzing apparatus according to claim 1, wherein the introduction timeof the sample gas is shorter when the number or concentration of theparticles measured by the particle measuring section is higher.